@inproceedings{6320afc50da74b23953c3c9db4a24318,
title = "Comprehensive and quantitative characterization and analysis method of 3D mask effect for lithography simulation",
abstract = "With the increasing requirement of lithographic resolution, the degradation of 3D mask effect on imaging cannot be ignored. The researches of its polarization properties and effect on imaging are of great significance to the development of imaging-based aberration measurement techniques and computational lithography. In this paper, a novel method for comprehensive and quantitative characterization of 3D mask effect is proposed. By comparing the far-field spectrum of Kirchhoff model and 3D mask model, the 3D mask effect is comprehensively and quantitatively characterized as the form of polarization aberration. Pupil-spectrum comprehensive analysis method and background glitch noise culling method are proposed to improve the systematicness and accuracy of 3D mask characterization. The simulation comprehensively analyzes the effect of mask line width and absorber thickness on all polarization properties of the 3D mask effect, showing that this method can provide a more comprehensive analysis of the 3D mask effect compared with the previous methods.",
keywords = "3D mask effect, Computational lithography, Polarization aberration, Rigorous electromagnetic field simulation",
author = "Enze Li and Yanqiu Li and Yang Liu and Yiyu Sun and Pengzhi Wei",
note = "Publisher Copyright: {\textcopyright} 2021 SPIE; 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies 2021 ; Conference date: 14-06-2021 Through 17-06-2021",
year = "2021",
doi = "10.1117/12.2604846",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Xiong Li and Xuan-Ming Duan and Mingbo Pu and Changtao Wang and Song Hu and Xiangang Luo",
booktitle = "10th International Symposium on Advanced Optical Manufacturing and Testing Technologies",
address = "United States",
}