Asymmetric Schottky Contacts in Bilayer MoS2 Field Effect Transistors

Antonio Di Bartolomeo*, Alessandro Grillo, Francesca Urban, Laura Iemmo, Filippo Giubileo, Giuseppe Luongo, Giampiero Amato, Luca Croin, Linfeng Sun, Shi Jun Liang, Lay Kee Ang

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

174 引用 (Scopus)

摘要

The high-bias electrical characteristics of back-gated field-effect transistors with chemical vapor deposition synthesized bilayer MoS2 channel and Ti Schottky contacts are discussed. It is found that oxidized Ti contacts on MoS2 form rectifying junctions with ≈0.3 to 0.5 eV Schottky barrier height. To explain the rectifying output characteristics of the transistors, a model is proposed based on two slightly asymmetric back-to-back Schottky barriers, where the highest current arises from image force barrier lowering at the electrically forced junction, while the reverse current is due to Schottky-barrier-limited injection at the grounded junction. The device achieves a photoresponsivity greater than 2.5 A W−1 under 5 mW cm−2 white-LED light. By comparing two- and four-probe measurements, it is demonstrated that the hysteresis and persistent photoconductivity exhibited by the transistor are peculiarities of the MoS2 channel rather than effects of the Ti/MoS2 interface.

源语言英语
文章编号1800657
期刊Advanced Functional Materials
28
28
DOI
出版状态已出版 - 11 7月 2018
已对外发布

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