Anisotropic Resonant Tunneling in Twist-Stacked van der Waals Heterostructure

Dan Guo, Huiwen Wang, Liu Yang, Weikang Dong, Boyu Xu, Shuang Du, Xuyan Rui, Qingrong Liang, Kenji Watanabe, Takashi Taniguchi, Zhiwei Wang*, Yan Xiong*, Wei Jiang*, Jiadong Zhou, Shoujun Zheng*

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

摘要

Resonant tunneling, with energy and momentum conservation, has been extensively studied in two-dimensional van der Waals heterostructures and has potential applications in band structure probing, multivalued logic, and oscillators. Lattice alignment is crucial in resonant tunneling transistors (RTTs) for achieving negative differential resistance (NDR) with a high peak-to-valley ratio (PVR) because twist-angle-induced momentum mismatch can break the resonant tunneling condition. Here, we report anisotropic resonant tunneling in twist-stacked ReSe2/h-BN/ReSe2 RTTs, where the PVR exhibits a strong dependence on the twist angle between the two ReSe2 layers, reaching a maximum at the twist angle of 102°. Theoretical calculations suggest that the twist angle modulates the joint density of states of the two anisotropic bands in ReSe2 layers during the tunneling process, significantly suppressing the valley current and thereby enhancing the PVR. Double NDR peaks were observed in twist-stacked RTTs, which are attributed to interband resonant tunneling. Moreover, our twist-stacked RTTs are utilized in multibit inverters and adjustable self-powered photodetectors, providing potentials for the design of high-performance RTTs and photodetectors via twist-stacked engineering.

源语言英语
期刊ACS Nano
DOI
出版状态已接受/待刊 - 2025

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Guo, D., Wang, H., Yang, L., Dong, W., Xu, B., Du, S., Rui, X., Liang, Q., Watanabe, K., Taniguchi, T., Wang, Z., Xiong, Y., Jiang, W., Zhou, J., & Zheng, S. (已接受/印刷中). Anisotropic Resonant Tunneling in Twist-Stacked van der Waals Heterostructure. ACS Nano. https://doi.org/10.1021/acsnano.4c13215