A Photoinitiator-Grafted Photoresist for Direct In Situ Lithography of Perovskite Quantum Dots

Shunsheng Wei, Jingrun Yuan, Gaoling Yang*, Haizheng Zhong, Yuping Dong, Jianbing Shi*

*此作品的通讯作者

科研成果: 期刊稿件文献综述同行评审

摘要

Precise pixel control of quantum dots (QDs) offers unparalleled opportunities for various display applications, such as the OLED and Micro-LED. However, precise selective patterning of QDs is still a challenge due to the lack of a design methodology. Therefore, the aim of this study was thus to develop a photoinitiator-grafted oligomer for “on demand” control of active free radicals to improve the line edge roughness in QD patterning. This photosensitive oligomer was constructed by grafting the photosensitive benzophenone structure onto a phenolic resin oligomer, thus resulting in the confinement of active free radicals and highly selective photolithography. As a proof of concept, we have demonstrated high-quality QD patterns with high resolution and low edge roughness by using direct in situ photolithography. This work opens an avenue for the precise design and synthesis of QD photoresists, improving the precision of QD patterning for display applications.

源语言英语
页(从-至)26397-26404
页数8
期刊ACS Applied Nano Materials
7
23
DOI
出版状态已出版 - 13 12月 2024

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Wei, S., Yuan, J., Yang, G., Zhong, H., Dong, Y., & Shi, J. (2024). A Photoinitiator-Grafted Photoresist for Direct In Situ Lithography of Perovskite Quantum Dots. ACS Applied Nano Materials, 7(23), 26397-26404. https://doi.org/10.1021/acsanm.3c06297