A Photoinitiator-Grafted Photoresist for Direct In Situ Lithography of Perovskite Quantum Dots

Shunsheng Wei; Jingrun Yuan; Gaoling Yang; Haizheng Zhong; Yuping Dong; Jianbing Shi

doi:10.1021/acsanm.3c06297

A Photoinitiator-Grafted Photoresist for Direct In Situ Lithography of Perovskite Quantum Dots

Shunsheng Wei, Jingrun Yuan, Gaoling Yang^*, Haizheng Zhong, Yuping Dong, Jianbing Shi^*

^*Corresponding author for this work

Research output: Contribution to journal › Review article › peer-review

Abstract

Precise pixel control of quantum dots (QDs) offers unparalleled opportunities for various display applications, such as the OLED and Micro-LED. However, precise selective patterning of QDs is still a challenge due to the lack of a design methodology. Therefore, the aim of this study was thus to develop a photoinitiator-grafted oligomer for “on demand” control of active free radicals to improve the line edge roughness in QD patterning. This photosensitive oligomer was constructed by grafting the photosensitive benzophenone structure onto a phenolic resin oligomer, thus resulting in the confinement of active free radicals and highly selective photolithography. As a proof of concept, we have demonstrated high-quality QD patterns with high resolution and low edge roughness by using direct in situ photolithography. This work opens an avenue for the precise design and synthesis of QD photoresists, improving the precision of QD patterning for display applications.

Original language	English
Journal	ACS Applied Nano Materials
DOIs	https://doi.org/10.1021/acsanm.3c06297
Publication status	Accepted/In press - 2023

Keywords

patterning
perovskite
photolithography
photopolymerization
quantum dots

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10.1021/acsanm.3c06297

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title = "A Photoinitiator-Grafted Photoresist for Direct In Situ Lithography of Perovskite Quantum Dots",

abstract = "Precise pixel control of quantum dots (QDs) offers unparalleled opportunities for various display applications, such as the OLED and Micro-LED. However, precise selective patterning of QDs is still a challenge due to the lack of a design methodology. Therefore, the aim of this study was thus to develop a photoinitiator-grafted oligomer for “on demand” control of active free radicals to improve the line edge roughness in QD patterning. This photosensitive oligomer was constructed by grafting the photosensitive benzophenone structure onto a phenolic resin oligomer, thus resulting in the confinement of active free radicals and highly selective photolithography. As a proof of concept, we have demonstrated high-quality QD patterns with high resolution and low edge roughness by using direct in situ photolithography. This work opens an avenue for the precise design and synthesis of QD photoresists, improving the precision of QD patterning for display applications.",

keywords = "patterning, perovskite, photolithography, photopolymerization, quantum dots",

author = "Shunsheng Wei and Jingrun Yuan and Gaoling Yang and Haizheng Zhong and Yuping Dong and Jianbing Shi",

note = "Publisher Copyright: {\textcopyright} 2024 American Chemical Society.",

year = "2023",

doi = "10.1021/acsanm.3c06297",

language = "English",

journal = "ACS Applied Nano Materials",

issn = "2574-0970",

publisher = "American Chemical Society",

}

TY - JOUR

T1 - A Photoinitiator-Grafted Photoresist for Direct In Situ Lithography of Perovskite Quantum Dots

AU - Wei, Shunsheng

AU - Yuan, Jingrun

AU - Yang, Gaoling

AU - Zhong, Haizheng

AU - Dong, Yuping

AU - Shi, Jianbing

PY - 2023

Y1 - 2023

N2 - Precise pixel control of quantum dots (QDs) offers unparalleled opportunities for various display applications, such as the OLED and Micro-LED. However, precise selective patterning of QDs is still a challenge due to the lack of a design methodology. Therefore, the aim of this study was thus to develop a photoinitiator-grafted oligomer for “on demand” control of active free radicals to improve the line edge roughness in QD patterning. This photosensitive oligomer was constructed by grafting the photosensitive benzophenone structure onto a phenolic resin oligomer, thus resulting in the confinement of active free radicals and highly selective photolithography. As a proof of concept, we have demonstrated high-quality QD patterns with high resolution and low edge roughness by using direct in situ photolithography. This work opens an avenue for the precise design and synthesis of QD photoresists, improving the precision of QD patterning for display applications.

AB - Precise pixel control of quantum dots (QDs) offers unparalleled opportunities for various display applications, such as the OLED and Micro-LED. However, precise selective patterning of QDs is still a challenge due to the lack of a design methodology. Therefore, the aim of this study was thus to develop a photoinitiator-grafted oligomer for “on demand” control of active free radicals to improve the line edge roughness in QD patterning. This photosensitive oligomer was constructed by grafting the photosensitive benzophenone structure onto a phenolic resin oligomer, thus resulting in the confinement of active free radicals and highly selective photolithography. As a proof of concept, we have demonstrated high-quality QD patterns with high resolution and low edge roughness by using direct in situ photolithography. This work opens an avenue for the precise design and synthesis of QD photoresists, improving the precision of QD patterning for display applications.

KW - patterning

KW - perovskite

KW - photolithography

KW - photopolymerization

KW - quantum dots

UR - http://www.scopus.com/inward/record.url?scp=85189556476&partnerID=8YFLogxK

U2 - 10.1021/acsanm.3c06297

DO - 10.1021/acsanm.3c06297

M3 - Review article

AN - SCOPUS:85189556476

SN - 2574-0970

JO - ACS Applied Nano Materials

JF - ACS Applied Nano Materials

ER -

A Photoinitiator-Grafted Photoresist for Direct In Situ Lithography of Perovskite Quantum Dots

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Keywords

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