Two-dimensionally patterned electrodeposition of Sn film from aqueous acid bath

Shunsuke Yagi; Erika Takeda; Takafumi Okada; Daobin Mu; Naoki Okamoto; Takeyasu Saito; Kazuo Kondo

doi:10.1149/2.012202eel

Two-dimensionally patterned electrodeposition of Sn film from aqueous acid bath

Shunsuke Yagi, Erika Takeda, Takafumi Okada, Daobin Mu, Naoki Okamoto, Takeyasu Saito, Kazuo Kondo

School of Material Science and Engineering

Osaka Metropolitan University

Research output: Contribution to journal › Article › peer-review

Abstract

The electrodeposition of two-dimensional Sn micropatterns without whisker growth was investigated using an aqueous acid bath. Polyethylene glycol suppressed the growth of Sn normal to the surface of a Cu foil substrate and flat Sn micropatterns were successfully obtained on various different photoresist-patterned Cu foils. The current efficiency of Sn electrodeposition was higher than 97% for all samples, although the pH of the solution was about 0.0, indicating that the overpotential of H2 evolution on the Sn/Cu substrate was quite large. Sn micropatterns, in the form of both lines and circles, showed a slight macroscopic stress relaxation effect.

Original language	English
Pages (from-to)	D8-D10
Journal	ECS Electrochemistry Letters
Volume	1
Issue number	2
DOIs	https://doi.org/10.1149/2.012202eel
Publication status	Published - 2012

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@article{c3a05effe6894fe690e6b57a9b33a69e,

title = "Two-dimensionally patterned electrodeposition of Sn film from aqueous acid bath",

abstract = "The electrodeposition of two-dimensional Sn micropatterns without whisker growth was investigated using an aqueous acid bath. Polyethylene glycol suppressed the growth of Sn normal to the surface of a Cu foil substrate and flat Sn micropatterns were successfully obtained on various different photoresist-patterned Cu foils. The current efficiency of Sn electrodeposition was higher than 97% for all samples, although the pH of the solution was about 0.0, indicating that the overpotential of H2 evolution on the Sn/Cu substrate was quite large. Sn micropatterns, in the form of both lines and circles, showed a slight macroscopic stress relaxation effect.",

author = "Shunsuke Yagi and Erika Takeda and Takafumi Okada and Daobin Mu and Naoki Okamoto and Takeyasu Saito and Kazuo Kondo",

year = "2012",

doi = "10.1149/2.012202eel",

language = "English",

volume = "1",

pages = "D8--D10",

journal = "ECS Electrochemistry Letters",

issn = "2162-8726",

publisher = "The Electrochemical Society",

number = "2",

}

TY - JOUR

T1 - Two-dimensionally patterned electrodeposition of Sn film from aqueous acid bath

AU - Yagi, Shunsuke

AU - Takeda, Erika

AU - Okada, Takafumi

AU - Mu, Daobin

AU - Okamoto, Naoki

AU - Saito, Takeyasu

AU - Kondo, Kazuo

PY - 2012

Y1 - 2012

N2 - The electrodeposition of two-dimensional Sn micropatterns without whisker growth was investigated using an aqueous acid bath. Polyethylene glycol suppressed the growth of Sn normal to the surface of a Cu foil substrate and flat Sn micropatterns were successfully obtained on various different photoresist-patterned Cu foils. The current efficiency of Sn electrodeposition was higher than 97% for all samples, although the pH of the solution was about 0.0, indicating that the overpotential of H2 evolution on the Sn/Cu substrate was quite large. Sn micropatterns, in the form of both lines and circles, showed a slight macroscopic stress relaxation effect.

AB - The electrodeposition of two-dimensional Sn micropatterns without whisker growth was investigated using an aqueous acid bath. Polyethylene glycol suppressed the growth of Sn normal to the surface of a Cu foil substrate and flat Sn micropatterns were successfully obtained on various different photoresist-patterned Cu foils. The current efficiency of Sn electrodeposition was higher than 97% for all samples, although the pH of the solution was about 0.0, indicating that the overpotential of H2 evolution on the Sn/Cu substrate was quite large. Sn micropatterns, in the form of both lines and circles, showed a slight macroscopic stress relaxation effect.

UR - http://www.scopus.com/inward/record.url?scp=84880404260&partnerID=8YFLogxK

U2 - 10.1149/2.012202eel

DO - 10.1149/2.012202eel

M3 - Article

AN - SCOPUS:84880404260

SN - 2162-8726

VL - 1

SP - D8-D10

JO - ECS Electrochemistry Letters

JF - ECS Electrochemistry Letters

IS - 2

ER -

Two-dimensionally patterned electrodeposition of Sn film from aqueous acid bath

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