Original language | English |
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Pages (from-to) | 798 |
Number of pages | 1 |
Journal | Digest of Technical Papers - SID International Symposium |
Volume | 50 |
Issue number | S1 |
DOIs | |
Publication status | Published - 2019 |
Event | International Conference on Display Technology, ICDT 2019 - Suzhou, China Duration: 26 Mar 2019 → 29 Mar 2019 |
The Effects of N2O and NH3 Plasma Treatment on the Device Performance of Solution-Processed Thin Film Transistors
Xuyang Li, Jin Cheng, Zhinong Yu
Research output: Contribution to journal › Conference article › peer-review