@inproceedings{9bb7562c0a334f31b803cb3dfe81058b,
title = "Source Optimization under Thick Mask Model",
abstract = "Source optimization(SO) is a key method of resolution enhancement technology. However, as the technique node enters 45 nm and below, the influence of thick mask effect has become apparent. The result of source optimization considering the mask as a thin film is inaccurate. In this paper, we propose a source optimization model considering thick mask structure. We establish the theoretical model of source optimization with gradient method and compressive sensing(CS) method. The typical masks of 45nm, 28nm and 22nm were selected for simulation. The optimized source provides better imaging performance, while the simulation speed has been improved by using CS method.",
keywords = "FDTD, compressive sensing, source optimization, thick mask",
author = "Yang Liu and Yiyu Sun and Yanqiu Li and Pengzhi Wei and Lihui Liu and Enze Li",
note = "Publisher Copyright: {\textcopyright} 2020 IEEE.; 4th International Workshop on Advanced Patterning Solutions, IWAPS 2020 ; Conference date: 05-11-2020 Through 06-11-2020",
year = "2020",
month = nov,
day = "5",
doi = "10.1109/IWAPS51164.2020.9286817",
language = "English",
series = "2020 4th International Workshop on Advanced Patterning Solutions, IWAPS 2020",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
editor = "Yayi Wei and Tianchun Ye",
booktitle = "2020 4th International Workshop on Advanced Patterning Solutions, IWAPS 2020",
address = "United States",
}