TY - JOUR
T1 - Small Feature-Size Transistors Based on Low-Dimensional Materials
T2 - From Structure Design to Nanofabrication Techniques
AU - Fu, Xiaqing
AU - Liu, Zhifang
AU - Wang, Huaipeng
AU - Xie, Dan
AU - Sun, Yilin
N1 - Publisher Copyright:
© 2024 The Author(s). Advanced Science published by Wiley-VCH GmbH.
PY - 2024/9/4
Y1 - 2024/9/4
N2 - For several decades after Moore's Law is proposed, there is a continuous effort to reduce the feature-size of transistors. However, as the size of transistors continues to decrease, numerous challenges and obstacles including severe short channel effects (SCEs) are emerging. Recently, low-dimensional materials have provided new opportunities for constructing small feature-size transistors due to their superior electrical properties compared to silicon. Here, state-of-the-art low-dimensional materials-based transistors with small feature-sizes are reviewed. Different from other works that mainly focus on material characteristics of a specific device structure, the discussed topics are utilizing device structure design including vertical structure and nano-gate structure, and nanofabrication techniques to achieve small feature-sizes of transistors. A comprehensive summary of these small feature-size transistors is presented by illustrating their operation mechanism, relevant fabrication processes, and corresponding performance parameters. Besides, the role of small feature-size transistors based on low-dimensional materials in further reducing the small footprint is also clarified and their cutting-edge applications are highlighted. Finally, a comparison and analysis between state-of-art transistors is made, as well as a glimpse into the future research trajectory of low dimensional materials-based small feature-size transistors is briefly outlined.
AB - For several decades after Moore's Law is proposed, there is a continuous effort to reduce the feature-size of transistors. However, as the size of transistors continues to decrease, numerous challenges and obstacles including severe short channel effects (SCEs) are emerging. Recently, low-dimensional materials have provided new opportunities for constructing small feature-size transistors due to their superior electrical properties compared to silicon. Here, state-of-the-art low-dimensional materials-based transistors with small feature-sizes are reviewed. Different from other works that mainly focus on material characteristics of a specific device structure, the discussed topics are utilizing device structure design including vertical structure and nano-gate structure, and nanofabrication techniques to achieve small feature-sizes of transistors. A comprehensive summary of these small feature-size transistors is presented by illustrating their operation mechanism, relevant fabrication processes, and corresponding performance parameters. Besides, the role of small feature-size transistors based on low-dimensional materials in further reducing the small footprint is also clarified and their cutting-edge applications are highlighted. Finally, a comparison and analysis between state-of-art transistors is made, as well as a glimpse into the future research trajectory of low dimensional materials-based small feature-size transistors is briefly outlined.
KW - nano-gate transistors
KW - nanofabrication
KW - small feature-size transistors
KW - vertical transistors
UR - http://www.scopus.com/inward/record.url?scp=85196035124&partnerID=8YFLogxK
U2 - 10.1002/advs.202400500
DO - 10.1002/advs.202400500
M3 - Review article
AN - SCOPUS:85196035124
SN - 2198-3844
VL - 11
JO - Advanced Science
JF - Advanced Science
IS - 33
M1 - 2400500
ER -