Abstract
The direct formation of graphene on various dielectric surfaces is successful via a single-step rapid thermal processing (RTP) of substrates coated with amorphous carbon (C) and nickel (Ni) thin films. High-quality graphene is obtained uniformly on the whole surface of wafers with a controlled number of graphene layers. The monolayer graphene exhibits a low sheet resistance and a high optical transmittance in the visible range.
Original language | English |
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Pages (from-to) | 630-634 |
Number of pages | 5 |
Journal | Advanced Materials |
Volume | 25 |
Issue number | 4 |
DOIs | |
Publication status | Published - 25 Jan 2013 |
Keywords
- Ni C
- Ni evaporation
- graphene
- rapid thermal annealing
- tansfer-free growth