Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam

Daniel S. Fox; Yangbo Zhou; Pierce Maguire; Arlene Oneill; Cormac Ócoileaín; Riley Gatensby; Alexey M. Glushenkov; Tao Tao; Georg S. Duesberg; Igor V. Shvets; Mohamed Abid; Mourad Abid; Han Chun Wu; Ying Chen; Jonathan N. Coleman; John F. Donegan; Hongzhou Zhang

doi:10.1021/acs.nanolett.5b01673

Nanopatterning and Electrical Tuning of MoS₂ Layers with a Subnanometer Helium Ion Beam

Daniel S. Fox, Yangbo Zhou, Pierce Maguire, Arlene Oneill, Cormac Ócoileaín, Riley Gatensby, Alexey M. Glushenkov, Tao Tao, Georg S. Duesberg, Igor V. Shvets, Mohamed Abid, Mourad Abid, Han Chun Wu, Ying Chen, Jonathan N. Coleman, John F. Donegan, Hongzhou Zhang^*

^*Corresponding author for this work

School of Physics

Research output: Contribution to journal › Article › peer-review

187 Citations (Scopus)

Abstract

We report subnanometer modification enabled by an ultrafine helium ion beam. By adjusting ion dose and the beam profile, structural defects were controllably introduced in a few-layer molybdenum disulfide (MoS₂) sample and its stoichiometry was modified by preferential sputtering of sulfur at a few-nanometer scale. Localized tuning of the resistivity of MoS₂ was demonstrated and semiconducting, metallic-like, or insulating material was obtained by irradiation with different doses of He⁺. Amorphous MoS_x with metallic behavior has been demonstrated for the first time. Fabrication of MoS₂ nanostructures with 7 nm dimensions and pristine crystal structure was also achieved. The damage at the edges of these nanostructures was typically confined to within 1 nm. Nanoribbons with widths as small as 1 nm were reproducibly fabricated. This nanoscale modification technique is a generalized approach that can be applied to various two-dimensional (2D) materials to produce a new range of 2D metamaterials.

Original language	English
Pages (from-to)	5307-5313
Number of pages	7
Journal	Nano Letters
Volume	15
Issue number	8
DOIs	https://doi.org/10.1021/acs.nanolett.5b01673
Publication status	Published - 12 Aug 2015

Keywords

Helium ion beam
MoS
electrical tuning
nanopatterning
nanoribbon
stoichiometry

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10.1021/acs.nanolett.5b01673

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Fox, D. S., Zhou, Y., Maguire, P., Oneill, A., Ócoileaín, C., Gatensby, R., Glushenkov, A. M., Tao, T., Duesberg, G. S., Shvets, I. V., Abid, M., Abid, M., Wu, H. C., Chen, Y., Coleman, J. N., Donegan, J. F., & Zhang, H. (2015). Nanopatterning and Electrical Tuning of MoS₂ Layers with a Subnanometer Helium Ion Beam. Nano Letters, 15(8), 5307-5313. https://doi.org/10.1021/acs.nanolett.5b01673

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title = "Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam",

abstract = "We report subnanometer modification enabled by an ultrafine helium ion beam. By adjusting ion dose and the beam profile, structural defects were controllably introduced in a few-layer molybdenum disulfide (MoS2) sample and its stoichiometry was modified by preferential sputtering of sulfur at a few-nanometer scale. Localized tuning of the resistivity of MoS2 was demonstrated and semiconducting, metallic-like, or insulating material was obtained by irradiation with different doses of He+. Amorphous MoSx with metallic behavior has been demonstrated for the first time. Fabrication of MoS2 nanostructures with 7 nm dimensions and pristine crystal structure was also achieved. The damage at the edges of these nanostructures was typically confined to within 1 nm. Nanoribbons with widths as small as 1 nm were reproducibly fabricated. This nanoscale modification technique is a generalized approach that can be applied to various two-dimensional (2D) materials to produce a new range of 2D metamaterials.",

keywords = "Helium ion beam, MoS, electrical tuning, nanopatterning, nanoribbon, stoichiometry",

author = "Fox, {Daniel S.} and Yangbo Zhou and Pierce Maguire and Arlene Oneill and Cormac {\'O}coilea{\'i}n and Riley Gatensby and Glushenkov, {Alexey M.} and Tao Tao and Duesberg, {Georg S.} and Shvets, {Igor V.} and Mohamed Abid and Mourad Abid and Wu, {Han Chun} and Ying Chen and Coleman, {Jonathan N.} and Donegan, {John F.} and Hongzhou Zhang",

note = "Publisher Copyright: {\textcopyright} 2015 American Chemical Society.",

year = "2015",

month = aug,

day = "12",

doi = "10.1021/acs.nanolett.5b01673",

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Fox, DS, Zhou, Y, Maguire, P, Oneill, A, Ócoileaín, C, Gatensby, R, Glushenkov, AM, Tao, T, Duesberg, GS, Shvets, IV, Abid, M, Abid, M, Wu, HC, Chen, Y, Coleman, JN, Donegan, JF & Zhang, H 2015, 'Nanopatterning and Electrical Tuning of MoS₂ Layers with a Subnanometer Helium Ion Beam', Nano Letters, vol. 15, no. 8, pp. 5307-5313. https://doi.org/10.1021/acs.nanolett.5b01673

TY - JOUR

T1 - Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam

AU - Fox, Daniel S.

AU - Zhou, Yangbo

AU - Maguire, Pierce

AU - Oneill, Arlene

AU - Ócoileaín, Cormac

AU - Gatensby, Riley

AU - Glushenkov, Alexey M.

AU - Tao, Tao

AU - Duesberg, Georg S.

AU - Shvets, Igor V.

AU - Abid, Mohamed

AU - Abid, Mourad

AU - Wu, Han Chun

AU - Chen, Ying

AU - Coleman, Jonathan N.

AU - Donegan, John F.

AU - Zhang, Hongzhou

PY - 2015/8/12

Y1 - 2015/8/12

N2 - We report subnanometer modification enabled by an ultrafine helium ion beam. By adjusting ion dose and the beam profile, structural defects were controllably introduced in a few-layer molybdenum disulfide (MoS2) sample and its stoichiometry was modified by preferential sputtering of sulfur at a few-nanometer scale. Localized tuning of the resistivity of MoS2 was demonstrated and semiconducting, metallic-like, or insulating material was obtained by irradiation with different doses of He+. Amorphous MoSx with metallic behavior has been demonstrated for the first time. Fabrication of MoS2 nanostructures with 7 nm dimensions and pristine crystal structure was also achieved. The damage at the edges of these nanostructures was typically confined to within 1 nm. Nanoribbons with widths as small as 1 nm were reproducibly fabricated. This nanoscale modification technique is a generalized approach that can be applied to various two-dimensional (2D) materials to produce a new range of 2D metamaterials.

AB - We report subnanometer modification enabled by an ultrafine helium ion beam. By adjusting ion dose and the beam profile, structural defects were controllably introduced in a few-layer molybdenum disulfide (MoS2) sample and its stoichiometry was modified by preferential sputtering of sulfur at a few-nanometer scale. Localized tuning of the resistivity of MoS2 was demonstrated and semiconducting, metallic-like, or insulating material was obtained by irradiation with different doses of He+. Amorphous MoSx with metallic behavior has been demonstrated for the first time. Fabrication of MoS2 nanostructures with 7 nm dimensions and pristine crystal structure was also achieved. The damage at the edges of these nanostructures was typically confined to within 1 nm. Nanoribbons with widths as small as 1 nm were reproducibly fabricated. This nanoscale modification technique is a generalized approach that can be applied to various two-dimensional (2D) materials to produce a new range of 2D metamaterials.

KW - Helium ion beam

KW - MoS

KW - electrical tuning

KW - nanopatterning

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SN - 1530-6984

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EP - 5313

JO - Nano Letters

JF - Nano Letters

IS - 8

ER -

Nanopatterning and Electrical Tuning of MoS₂ Layers with a Subnanometer Helium Ion Beam

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Keywords

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