Nano-grating fabrication technique

Huimin Xie*, Zhanwei Liu, Ming Zhang, Pengwan Chen, Fenglei Huang, Qing Ming Zhang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

In this paper, a novel nano-moiré grating fabrication technique was proposed for nanometer deformation measurement. The grating fabrication process was performed with the aid of Atomic Force Microscope (AFM) on the basis of micro-fabrication technique. On the analysis of some correlative factors of influencing grating line quality, some important experimental parameters were optimized. In this study, some parallel and cross nano-gratings with frequencies of from 10000lines/mm to 20000lines/mm were fabricated. The successful experimental results demonstrate that the nano-grating fabrication technique is feasible and also indicated that these nano-gratings with nano-moiré method can be applied to deformation measurement, which offers a nanometer sensitivity and spatial resolution.

Original languageEnglish
Pages (from-to)131-134
Number of pages4
JournalKey Engineering Materials
Volume326-328 I
DOIs
Publication statusPublished - 2006

Keywords

  • Nano-grating
  • Nano-moiré
  • Nanolithography

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