Magneto-resistance for two-dimensional electron gas in GaN/AlxGa1-xN heterostructure

Wei Wang, Wen Zheng Zhou*, Shang Jiang Wei, Xiao Juan Li, Zhi Gang Chang, Tie Lin, Li Yan Shang, Kui Han, Jun Xi Duan, Ning Tang, Bo Shen, Jun Hao Chu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The magnetotransport measurement is performed on a GaN/AlxGa1-xN heterostructure sample in a low temperature range of 1.4-25 K and at magnetic fields ranging from 0 T up to 13 T. Magnetoresistance of a two-dimensional electron gas confined in the heterostructure is investigated. The negative magnetoresistivity in the whole magnetic field range originates from the electron-electron interactions (EEIs), while the positive magnetoresistivity in the high field range results from the parallel conductance. The EEI correction terms, as well as the concentration and mobility of the parallel channel are obtained by fitting the experimental data. Furthermore, another method of calculation is used to check their accuracy.

Original languageEnglish
Article number237302
JournalWuli Xuebao/Acta Physica Sinica
Volume61
Issue number23
Publication statusPublished - 5 Dec 2012
Externally publishedYes

Keywords

  • Electron-electron interaction
  • Magnetoresistance
  • Parallel conductance
  • Two-dimensional electron gas

Fingerprint

Dive into the research topics of 'Magneto-resistance for two-dimensional electron gas in GaN/AlxGa1-xN heterostructure'. Together they form a unique fingerprint.

Cite this