Laser direct writing graphene patterns on SiO2/Si substrates

Lisha Fan, Wei Xiong, Yang Gao, Jongbok Park, Yunshen Zhou, Lan Jiang, Yongfeng Lu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

Direct fabrication of graphene patterns on SiO2/Si substrates was demonstrated using a single-step laser-induced chemical vapor deposition (LCVD) process. A laser beam was used to irradiate a nickel-coated SiO 2/Si substrate in a methane-hydrogen environment to induce a local temperature rise on the laser focused area. Followed by a rapid cooling process by moving the laser beam, graphene patterns were formed on the laser scanning pathway. Nickel (Ni) layer under graphene patterns was removed by the Ni etchant diffused into the area under the graphene. Laser direct writing graphene patterns on SiO2/Si substrates was achieved. Energy dispersive X-ray diffraction spectroscopy was used to confirm the removal of Ni layers. The discovery and development of the LCVD growth process provide a route for the rapid fabrication of graphene-based electronic devices.

Original languageEnglish
Title of host publicationLaser-Based Micro- and Nanopackaging and Assembly VII
DOIs
Publication statusPublished - 2013
EventLaser-Based Micro- and Nanopackaging and Assembly VII, LBMP 2013 - San Francisco, CA, United States
Duration: 6 Feb 20137 Feb 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8608
ISSN (Print)0277-786X

Conference

ConferenceLaser-Based Micro- and Nanopackaging and Assembly VII, LBMP 2013
Country/TerritoryUnited States
CitySan Francisco, CA
Period6/02/137/02/13

Keywords

  • Graphene patterns
  • Laser direct writing
  • Laser-induced chemical vapor deposition

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