Highly sensitive and homogeneous SERS substrate fabricated by a femtosecond laser combined with dewetting

Xudong Tan; Lan Jiang; Jie Hu; Pengjun Liu; Andong Wang; Yong Lu

doi:10.3788/COL201513.111401

Highly sensitive and homogeneous SERS substrate fabricated by a femtosecond laser combined with dewetting

Xudong Tan, Lan Jiang, Jie Hu^*, Pengjun Liu, Andong Wang, Yong Lu

^*Corresponding author for this work

School of Mechanical Engineering

Beijing Institute of Technology

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

We report a simple, cost-effective and repeatable method for fabricating a large area and uniform substrate for surface-enhanced Raman scattering (SERS). The silicon, micromachined by a femtosecond laser, is coated with gold film and then treated through the dewetting process. The morphology shows a higher electric field enhancement due to light trapping. The enhancement factor of the SERS substrate is 9.2 × 10⁷ with a 5 nm-thick film coated. Moreover, it also exhibits a uniform signal through Raman mapping and chemical stability with the greatest intensity deviation of 6% after a month. The proposed technique provides an opportunity to equip microchips with the SERS capabilities of high sensitivity, chemical stability, and homogeneous signals.

Original language	English
Article number	111401
Journal	Chinese Optics Letters
Volume	13
Issue number	11
DOIs	https://doi.org/10.3788/COL201513.111401
Publication status	Published - 10 Nov 2015

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Tan, X., Jiang, L., Hu, J., Liu, P., Wang, A., & Lu, Y. (2015). Highly sensitive and homogeneous SERS substrate fabricated by a femtosecond laser combined with dewetting. Chinese Optics Letters, 13(11), Article 111401. https://doi.org/10.3788/COL201513.111401

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abstract = "We report a simple, cost-effective and repeatable method for fabricating a large area and uniform substrate for surface-enhanced Raman scattering (SERS). The silicon, micromachined by a femtosecond laser, is coated with gold film and then treated through the dewetting process. The morphology shows a higher electric field enhancement due to light trapping. The enhancement factor of the SERS substrate is 9.2 × 107 with a 5 nm-thick film coated. Moreover, it also exhibits a uniform signal through Raman mapping and chemical stability with the greatest intensity deviation of 6% after a month. The proposed technique provides an opportunity to equip microchips with the SERS capabilities of high sensitivity, chemical stability, and homogeneous signals.",

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AU - Tan, Xudong

AU - Jiang, Lan

AU - Hu, Jie

AU - Liu, Pengjun

AU - Wang, Andong

AU - Lu, Yong

PY - 2015/11/10

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N2 - We report a simple, cost-effective and repeatable method for fabricating a large area and uniform substrate for surface-enhanced Raman scattering (SERS). The silicon, micromachined by a femtosecond laser, is coated with gold film and then treated through the dewetting process. The morphology shows a higher electric field enhancement due to light trapping. The enhancement factor of the SERS substrate is 9.2 × 107 with a 5 nm-thick film coated. Moreover, it also exhibits a uniform signal through Raman mapping and chemical stability with the greatest intensity deviation of 6% after a month. The proposed technique provides an opportunity to equip microchips with the SERS capabilities of high sensitivity, chemical stability, and homogeneous signals.

AB - We report a simple, cost-effective and repeatable method for fabricating a large area and uniform substrate for surface-enhanced Raman scattering (SERS). The silicon, micromachined by a femtosecond laser, is coated with gold film and then treated through the dewetting process. The morphology shows a higher electric field enhancement due to light trapping. The enhancement factor of the SERS substrate is 9.2 × 107 with a 5 nm-thick film coated. Moreover, it also exhibits a uniform signal through Raman mapping and chemical stability with the greatest intensity deviation of 6% after a month. The proposed technique provides an opportunity to equip microchips with the SERS capabilities of high sensitivity, chemical stability, and homogeneous signals.

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Highly sensitive and homogeneous SERS substrate fabricated by a femtosecond laser combined with dewetting

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