Gate-Tunable Tunneling Resistance in Graphene/Topological Insulator Vertical Junctions

Liang Zhang, Yuan Yan, Han Chun Wu, Dapeng Yu, Zhi Min Liao*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

36 Citations (Scopus)

Abstract

Graphene-based vertical heterostructures, particularly stacks incorporated with other layered materials, are promising for nanoelectronics. The stacking of two model Dirac materials, graphene and topological insulator, can considerably enlarge the family of van der Waals heterostructures. Despite good understanding of the two individual materials, the electron transport properties of a combined vertical heterojunction are still unknown. Here, we show the experimental realization of a vertical heterojunction between Bi2Se3 nanoplate and monolayer graphene. At low temperatures, the electron transport through the vertical heterojunction is dominated by the tunneling process, which can be effectively tuned by gate voltage to alter the density of states near the Fermi surface. In the presence of a magnetic field, quantum oscillations are observed due to the quantized Landau levels in both graphene and the two-dimensional surface states of Bi2Se3. Furthermore, we observe an exotic gate-tunable tunneling resistance under high magnetic field, which displays resistance maxima when the underlying graphene becomes a quantum Hall insulator.

Original languageEnglish
Pages (from-to)3816-3822
Number of pages7
JournalACS Nano
Volume10
Issue number3
DOIs
Publication statusPublished - 22 Mar 2016

Keywords

  • gate voltage modulation
  • graphene
  • topological insulators
  • tunneling resistance
  • van der Waals heterostructures

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