TY - JOUR
T1 - 空心阴极羽流等离子体放电不稳定性二维仿真模型
AU - Tian, Feng
AU - Miao, Long
AU - Liang, Fuwen
AU - Song, Jiahui
AU - He, Zihao
AU - Wu, Zhiwen
AU - Wang, Ningfei
N1 - Publisher Copyright:
© 2024 China Ordnance Industry Corporation. All rights reserved.
PY - 2024/4
Y1 - 2024/4
N2 - In the process of hollow cathode discharge, the space potential oscillation affects its working performance, and the high-energy ions generated in the oscillation process cause sputtering corrosion to the cathode orifice, which seriously affect the lifetime of hollow cathode. In this paper, an integrated coupling model consisting of prticle-in-cell (PIC) model, oscillation amplitude model and equivalent circuit model is established to calculate the potential oscillation characteristics of hollow cathode. Firstly, PIC model is used to calculate the discharge characteristics of plume plasma under the conditions of different discharge currents, discharge voltages and gas flow rates, and the spatial plasma distribution of time-averaged parameters such as plume potential, plasma number density, electric field strength and electron temperature is obtained. Secondly, based on the plasma aggregation and dissipation theory, the potential oscillation amplitude model is established, and the spatial potential oscillation amplitude is estimated according to the calculated time-averaged parameters. Finally, the plasma time-averaged parameters and potential amplitude oscillation parameters are taken as input parameters and brought into the hollow cathode discharge equivalent circuit model to obtain the potential oscillation waveform under the corresponding working conditions. By comparing with the experimental results, it is found that the integrated coupling model established in this paper can predict the plasma potential oscillation of hollow cathode plume, and the research results can be used to guide the stable discharge of hollow cathode, thus improving its service lifetime.
AB - In the process of hollow cathode discharge, the space potential oscillation affects its working performance, and the high-energy ions generated in the oscillation process cause sputtering corrosion to the cathode orifice, which seriously affect the lifetime of hollow cathode. In this paper, an integrated coupling model consisting of prticle-in-cell (PIC) model, oscillation amplitude model and equivalent circuit model is established to calculate the potential oscillation characteristics of hollow cathode. Firstly, PIC model is used to calculate the discharge characteristics of plume plasma under the conditions of different discharge currents, discharge voltages and gas flow rates, and the spatial plasma distribution of time-averaged parameters such as plume potential, plasma number density, electric field strength and electron temperature is obtained. Secondly, based on the plasma aggregation and dissipation theory, the potential oscillation amplitude model is established, and the spatial potential oscillation amplitude is estimated according to the calculated time-averaged parameters. Finally, the plasma time-averaged parameters and potential amplitude oscillation parameters are taken as input parameters and brought into the hollow cathode discharge equivalent circuit model to obtain the potential oscillation waveform under the corresponding working conditions. By comparing with the experimental results, it is found that the integrated coupling model established in this paper can predict the plasma potential oscillation of hollow cathode plume, and the research results can be used to guide the stable discharge of hollow cathode, thus improving its service lifetime.
KW - dissipation
KW - equivalent circuit model
KW - hollow cathode
KW - plasma aggregation
KW - potential oscillation
KW - prticle-in-cell model
UR - http://www.scopus.com/inward/record.url?scp=85195046772&partnerID=8YFLogxK
U2 - 10.12382/bgxb.2022.0946
DO - 10.12382/bgxb.2022.0946
M3 - 文章
AN - SCOPUS:85195046772
SN - 1000-1093
VL - 45
SP - 1208
EP - 1218
JO - Binggong Xuebao/Acta Armamentarii
JF - Binggong Xuebao/Acta Armamentarii
IS - 4
ER -