The calculation and representation of polarization aberration induced by 3D mask in lithography simulation

Yunyun Hao, Yanqiu Li*, Tie Li, Naiyuan Sheng

*此作品的通讯作者

科研成果: 书/报告/会议事项章节 › 会议稿件 › 同行评审

4 引用 （Scopus）

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Engineering

Medicine and Dentistry