Source optimization for anamorphic magnification high-numerical aperture extreme ultraviolet lithography based on thick mask model

Chengcheng Wang, Ang Li, Pengzhi Wei, Lihui Liu*, Zhaoxun Li, Yanqiu Li*

*此作品的通讯作者

科研成果: 书/报告/会议事项章节 › 会议稿件 › 同行评审

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