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Retrieve polarization aberration from image degradation: A new measurement method in DUV lithography
Zhongbo Xiang,
Yanqiu Li
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此作品的通讯作者
光电学院
Beijing Institute of Technology
科研成果
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引用 (Scopus)
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探究 'Retrieve polarization aberration from image degradation: A new measurement method in DUV lithography' 的科研主题。它们共同构成独一无二的指纹。
分类
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Engineering
Lithography
100%
Situ Measurement
100%
Aerial Image
100%
Aberration Coefficient
100%
Demonstrates
50%
Simulation Result
50%
Conductive
50%
One Dimensional
50%
Optimisation Problem
50%
Nonlinear System
50%
Least Square
50%
Quadratic Equation
50%
Coupling Effect
50%
Square Method
50%
Precise Measurement
50%
Earth and Planetary Sciences
Measurement Method
100%
In Situ Measurement
66%
Nonlinear System
33%