Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field

Tie Li, Yiyu Sun, Enze Li, Naiyuan Sheng, Yanqiu Li*, Pengzhi Wei, Yang Liu

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

15 引用 (Scopus)

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Engineering

Material Science

Earth and Planetary Sciences