TY - JOUR
T1 - Measurement and analysis of EMF around pulsed power supplies
AU - Cao, Ronggang
AU - Zou, Jun
AU - Yuan, Jiansheng
PY - 2009/9
Y1 - 2009/9
N2 - The pulse current generated by pulsed power supply could be several hundred thousand amperes, which could produce great interference to the electronic apparatus and other modules of the power supply. Thereby, the measurement of spatial and temporal distributions of radiated electromagnetic fields could be useful. Two supplies with spark gap (SG) switches and silicon controlled rectifier (SCR) switches are focused, and both use capacitors to store energy. Several B-dot probes, D-dot probes and a digital oscilloscope, with enough sampling rate and memory depth, are used to measure the magnetic and electric fields. The result shows that the spectrum of magnetic fields around SG switches can reach 10 MHz, while that around SCR switches is less than 1 MHz. The latter would be better for the system electromagnetic compatibility.
AB - The pulse current generated by pulsed power supply could be several hundred thousand amperes, which could produce great interference to the electronic apparatus and other modules of the power supply. Thereby, the measurement of spatial and temporal distributions of radiated electromagnetic fields could be useful. Two supplies with spark gap (SG) switches and silicon controlled rectifier (SCR) switches are focused, and both use capacitors to store energy. Several B-dot probes, D-dot probes and a digital oscilloscope, with enough sampling rate and memory depth, are used to measure the magnetic and electric fields. The result shows that the spectrum of magnetic fields around SG switches can reach 10 MHz, while that around SCR switches is less than 1 MHz. The latter would be better for the system electromagnetic compatibility.
KW - Electromagnetic field measurement
KW - Electromagnetic interference
KW - Pulsed power supply
KW - Silicon controlled rectifier switch
KW - Spark gap switch
UR - http://www.scopus.com/inward/record.url?scp=70349171334&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:70349171334
SN - 1001-4322
VL - 21
SP - 1426
EP - 1430
JO - Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams
JF - Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams
IS - 9
ER -