Graphitic carbon nitride thin films deposited by electrodeposition

Chao Li; Chuan Bao Cao; He Sun Zhu

doi:10.1016/j.matlet.2003.11.024

Graphitic carbon nitride thin films deposited by electrodeposition

Chao Li, Chuan Bao Cao^*, He Sun Zhu

^*此作品的通讯作者

材料学院

科研成果: 期刊稿件 › 文章 › 同行评审

77 引用（Scopus）

摘要

Electrodeposition method was used to deposit the graphitic carbon nitride thin film on Si (100) substrate from a saturated acetonitrile solution of 2,4,6-trichloro-1,3,5-triazine and 2,4,6-triamino-1,3,5-trazine at room temperature. X-ray powder diffraction (XRD) results show that the d-values are in good agreement with the data of graphite-like carbon nitride calculated in the literature. X-ray photoelectron spectra (XPS) measurements indicate the elements in the deposited films were mostly of C and N (N/C=0.88), and N bonded with C in the forms of C-N and C=N bond. The Fourier transform infrared (FTIR) spectroscopy indicates that CN aromatic ring exists in the product. These results demonstrate that crystalline g-C₃N₄ was obtained.

源语言	英语
页（从-至）	1903-1906
页数	4
期刊	Materials Letters
卷	58
期	12-13
DOI	https://doi.org/10.1016/j.matlet.2003.11.024
出版状态	已出版 - 5月 2004

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10.1016/j.matlet.2003.11.024

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Li, C., Cao, C. B., & Zhu, H. S. (2004). Graphitic carbon nitride thin films deposited by electrodeposition. Materials Letters, 58(12-13), 1903-1906. https://doi.org/10.1016/j.matlet.2003.11.024

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title = "Graphitic carbon nitride thin films deposited by electrodeposition",

abstract = "Electrodeposition method was used to deposit the graphitic carbon nitride thin film on Si (100) substrate from a saturated acetonitrile solution of 2,4,6-trichloro-1,3,5-triazine and 2,4,6-triamino-1,3,5-trazine at room temperature. X-ray powder diffraction (XRD) results show that the d-values are in good agreement with the data of graphite-like carbon nitride calculated in the literature. X-ray photoelectron spectra (XPS) measurements indicate the elements in the deposited films were mostly of C and N (N/C=0.88), and N bonded with C in the forms of C-N and C=N bond. The Fourier transform infrared (FTIR) spectroscopy indicates that CN aromatic ring exists in the product. These results demonstrate that crystalline g-C3N4 was obtained.",

keywords = "Carbon nitride, Electrodeposition, Thin films, g-CN",

author = "Chao Li and Cao, {Chuan Bao} and Zhu, {He Sun}",

year = "2004",

month = may,

doi = "10.1016/j.matlet.2003.11.024",

language = "English",

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pages = "1903--1906",

journal = "Materials Letters",

issn = "0167-577X",

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TY - JOUR

T1 - Graphitic carbon nitride thin films deposited by electrodeposition

AU - Li, Chao

AU - Cao, Chuan Bao

AU - Zhu, He Sun

PY - 2004/5

Y1 - 2004/5

N2 - Electrodeposition method was used to deposit the graphitic carbon nitride thin film on Si (100) substrate from a saturated acetonitrile solution of 2,4,6-trichloro-1,3,5-triazine and 2,4,6-triamino-1,3,5-trazine at room temperature. X-ray powder diffraction (XRD) results show that the d-values are in good agreement with the data of graphite-like carbon nitride calculated in the literature. X-ray photoelectron spectra (XPS) measurements indicate the elements in the deposited films were mostly of C and N (N/C=0.88), and N bonded with C in the forms of C-N and C=N bond. The Fourier transform infrared (FTIR) spectroscopy indicates that CN aromatic ring exists in the product. These results demonstrate that crystalline g-C3N4 was obtained.

AB - Electrodeposition method was used to deposit the graphitic carbon nitride thin film on Si (100) substrate from a saturated acetonitrile solution of 2,4,6-trichloro-1,3,5-triazine and 2,4,6-triamino-1,3,5-trazine at room temperature. X-ray powder diffraction (XRD) results show that the d-values are in good agreement with the data of graphite-like carbon nitride calculated in the literature. X-ray photoelectron spectra (XPS) measurements indicate the elements in the deposited films were mostly of C and N (N/C=0.88), and N bonded with C in the forms of C-N and C=N bond. The Fourier transform infrared (FTIR) spectroscopy indicates that CN aromatic ring exists in the product. These results demonstrate that crystalline g-C3N4 was obtained.

KW - Carbon nitride

KW - Electrodeposition

KW - Thin films

KW - g-CN

UR - http://www.scopus.com/inward/record.url?scp=1642632949&partnerID=8YFLogxK

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VL - 58

SP - 1903

EP - 1906

JO - Materials Letters

JF - Materials Letters

IS - 12-13

ER -

Graphitic carbon nitride thin films deposited by electrodeposition

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