摘要
The growth, interfacial reaction, and Fermi level movement of Gd on n-type GaN(0001)-(1×1) surface were studied by using x-ray photoelectron spectroscopy. It was observed that the annealing promotes further diffusion and an interfacial Gd-Ga exchange reaction which reduces the Schottky barrier height. It was found that the Gd grows in a layer-by-layer-like mode and reacts with the substrate at the interface which lead to the formation of metallic Ga at room temperature.
源语言 | 英语 |
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页(从-至) | 4847-4852 |
页数 | 6 |
期刊 | Journal of Applied Physics |
卷 | 94 |
期 | 8 |
DOI | |
出版状态 | 已出版 - 15 10月 2003 |
已对外发布 | 是 |