Fast and high-fidelity EUV curvilinear mask optimization by distance-versus-angle signature

Engineering

• Control Point 100%
• Nodes 50%
• Simulation Result 50%
• One Dimensional 50%
• Lithography 50%
• Error Pattern 50%
• Two Dimensional 50%
• Common Method 50%
• Design Data 50%
• Dimensional Function 50%

Computer Science

• Correction Method 100%
• Image Quality 50%
• Information Storage 50%
• Vertical Direction 50%
• Horizontal Direction 50%
• Dimensional Function 50%

Medicine and Dentistry

• Image Quality 100%