@article{d7841ee7c2c147cb853b4840da1162e4,
title = "Erratum: Binary mask optimization for forward lithography based on boundary layer model in coherent systems (Journal of the Optical Society of America A: Optics and Image Science, and Vision (2009) 26 (1687-1692))",
author = "Xu Ma and Arce, {Gonzalo R.}",
year = "2010",
month = jan,
day = "1",
doi = "10.1364/JOSAA.27.000082",
language = "English",
volume = "27",
pages = "82--84",
journal = "Journal of the Optical Society of America A: Optics and Image Science, and Vision",
issn = "1084-7529",
publisher = "Optica Publishing Group",
number = "1",
}