Effect of thickness and crystalline morphology on electrical properties of rf-magnetron sputtering deposited Bi4Ti3O12 thin films
Shuai Ma, Xingwang Cheng*, Zhaolong Ma, Tayyeb Ali, Zhijun Xu, Ruiqing Chu
*此作品的通讯作者
科研成果: 期刊稿件 › 文章 › 同行评审
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