Effect of thickness and crystalline morphology on electrical properties of rf-magnetron sputtering deposited Bi4Ti3O12 thin films

Shuai Ma, Xingwang Cheng*, Zhaolong Ma, Tayyeb Ali, Zhijun Xu, Ruiqing Chu

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

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Material Science

Engineering