Design of EUVL camera with large numerical aperture

Yanqiu Li; Takeo Watanabe; Hiroo Kinoshita

Design of EUVL camera with large numerical aperture

Yanqiu Li^*, Takeo Watanabe, Hiroo Kinoshita

^*此作品的通讯作者

University of Hyogo

科研成果: 期刊稿件 › 会议文章 › 同行评审

1 引用（Scopus）

摘要

A design of four mirror imaging optics has been presented. The optics is designed for 50 nm at the wavelength of 13.5 nm. The exposure field is 25 mm×0.5 mm on wafer. The astigmatism and the distortion are corrected well in the ring field. The study shows a potential solution of four-mirror camera with numerical aperture (NA)≥0.15 for extreme ultraviolet lithography (EUVL). The ring is still not large enough to meet the requirements of EUVL.

源语言	英语
页（从-至）	759-764
页数	6
期刊	Proceedings of SPIE - The International Society for Optical Engineering
卷	3997
出版状态	已出版 - 2000
已对外发布	是
活动	Emerging Lithographic Technologies IV - Santa Clara, CA, USA 期限: 28 2月 2000 → 1 3月 2000

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title = "Design of EUVL camera with large numerical aperture",

abstract = "A design of four mirror imaging optics has been presented. The optics is designed for 50 nm at the wavelength of 13.5 nm. The exposure field is 25 mm×0.5 mm on wafer. The astigmatism and the distortion are corrected well in the ring field. The study shows a potential solution of four-mirror camera with numerical aperture (NA)≥0.15 for extreme ultraviolet lithography (EUVL). The ring is still not large enough to meet the requirements of EUVL.",

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AU - Li, Yanqiu

AU - Watanabe, Takeo

AU - Kinoshita, Hiroo

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AB - A design of four mirror imaging optics has been presented. The optics is designed for 50 nm at the wavelength of 13.5 nm. The exposure field is 25 mm×0.5 mm on wafer. The astigmatism and the distortion are corrected well in the ring field. The study shows a potential solution of four-mirror camera with numerical aperture (NA)≥0.15 for extreme ultraviolet lithography (EUVL). The ring is still not large enough to meet the requirements of EUVL.

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M3 - Conference article

AN - SCOPUS:0033683766

SN - 0277-786X

VL - 3997

SP - 759

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JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Emerging Lithographic Technologies IV

Y2 - 28 February 2000 through 1 March 2000

ER -

Design of EUVL camera with large numerical aperture

摘要

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