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Computational Lithography
Xu Ma
*
, Gonzalo R. Arce
*
此作品的通讯作者
University of California at Berkeley
University of Delaware
科研成果
:
书/报告
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书
›
同行评审
135
引用 (Scopus)
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探究 'Computational Lithography' 的科研主题。它们共同构成独一无二的指纹。
分类
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按字母排序
Engineering
Lithography
100%
Optical Lithography
80%
Magnetic Field
20%
Illustrates
20%
Electrical System
20%
Optimization Approach
20%
Integrated Circuit
20%
Infrastructure
20%
Significant Change
20%
Manufacturing Engineering
20%
Depth Discussion
20%
Computer Science
Mathematical Optimization
100%
Optimization Framework
33%
Integrated Circuits
33%
Inverse Problem
33%
Development Activity
33%
Material Science
Lithography
100%
Optical Lithography
80%
Electronic Circuit
20%
Medicine and Dentistry
Graduate Student
100%
Chemical Engineering
Lithography
100%