TY - GEN
T1 - Atomic-layer lithography of sub-10-nm plasmonic nanogaps on flat metallic surface
AU - Ji, Dengxin
AU - Chen, Borui
AU - Zeng, Xie
AU - Moein, Tania
AU - Song, Haomin
AU - Zhang, Nan
AU - Gan, Qiaoqiang
AU - Cartwright, Alexander
N1 - Publisher Copyright:
© 2015 Optical Society of America.
PY - 2015
Y1 - 2015
N2 - We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.
AB - We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.
UR - http://www.scopus.com/inward/record.url?scp=85085850387&partnerID=8YFLogxK
U2 - 10.1364/fio.2015.fth3f.3
DO - 10.1364/fio.2015.fth3f.3
M3 - Conference contribution
AN - SCOPUS:85085850387
T3 - Proceedings of Frontiers in Optics 2015, FIO 2015
BT - Proceedings of Frontiers in Optics 2015, FIO 2015
PB - OSA - The Optical Society
T2 - Frontiers in Optics 2015, FIO 2015
Y2 - 18 October 2015 through 22 October 2015
ER -