Approaching the resolution limit of W-C nano-gaps using focused ion beam chemical vapour deposition

Jun Dai*, Hui Chang, Etsuo Maeda, Shin'ichi Warisawa, Reo Kometani

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

2 引用 (Scopus)

指纹

探究 'Approaching the resolution limit of W-C nano-gaps using focused ion beam chemical vapour deposition' 的科研主题。它们共同构成独一无二的指纹。

Material Science

Engineering