摘要
This paper reports a single-crystalline silicon (SCS)-based micromirror with large scanning angle (up to 31°) which can be used for biomédical imaging. The micromirror is fabricated by using a deep reactive-ion-etch (DRIE) post-CMOS micromachining process. Thin bimorph actuation structures and movable bulk silicon structures are simultaneously achieved. The micromirror is 1 mm by 1 mm in size, coated with aluminum, and thermally actuated by an integrated polysilicon heater. The radius of curvature of the mirror surface is about 50 cm. The mirror rotates 31° at 9 mA. The resonant frequency of the device is 380 Hz.
源语言 | 英语 |
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页(从-至) | 861-863 |
页数 | 3 |
期刊 | OSA Trends in Optics and Photonics Series |
卷 | 88 |
出版状态 | 已出版 - 2003 |
已对外发布 | 是 |
活动 | Conference on Lasers and Electro-Optics (CLEO); Postconference Digest - Baltimore, MD, 美国 期限: 1 6月 2003 → 6 6月 2003 |