A method of tolerance analysis for wavefront error of lithographic projection lens

Yuanying Fu, Yanqiu Li*, Xiaolin Liu, Zhen Cao, Ke Liu

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

5 引用 (Scopus)

摘要

A simple and reliable method of tolerance analysis is proposed to ensure the performance of lithographic projection lens and minimize the manufacturing costs of lithographic projection lens. This method defines P-V wavefront error as merit function based on RMS wavefront error, and selects the optimal compensators. Compared to present methods, this method decreases mechanical complexity and minimizes the manufacturing costs by adopting less compensators, with both RMS wavefront error and P-V wavefront error achieving the requirement. As an example the method is applied to a refractive projection lens for 90nm resolution lithography projection lens designed by us. The results show that, only with 7 compensators, RMS wavefront error and P-V wavefront error at 97.7% probability are less than 0.0412 λ and 0.2469 λ, respectively. In conclusion, this method is able to meet the performance requirement of lithographic projection lens.

源语言英语
页(从-至)289-294
页数6
期刊Guangxue Jishu/Optical Technique
40
4
DOI
出版状态已出版 - 7月 2014

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Fu, Y., Li, Y., Liu, X., Cao, Z., & Liu, K. (2014). A method of tolerance analysis for wavefront error of lithographic projection lens. Guangxue Jishu/Optical Technique, 40(4), 289-294. https://doi.org/10.3788/gxjs20144004.0289