A global plasma model for reactive deposition of compound films by modulated pulsed power magnetron sputtering discharges

B. C. Zheng, Z. L. Wu, B. Wu, Y. G. Li, M. K. Lei*

*此作品的通讯作者

科研成果: 期刊稿件 › 文章 › 同行评审

25 引用 （Scopus）

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Chemical Engineering