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郑 博聪
物理学院
h-index
710
引用
15
H-指数
根据储存在 Pure 的刊物以及来自 Scopus 的引用文献数量计算
2012
2024
每年的科研成果
概览
指纹图谱
合作网络
科研成果
(49)
相似学者
(2)
指纹图谱
深入其中 Bocong Zheng 为活跃的研究主题。这些主题标签来自此人的成果。它们共同形成唯一的指纹。
分类
加权
按字母排序
Physics
Blood Plasma
26%
Boltzmann Equation
31%
Cold Plasma
26%
Dielectrics
13%
Distribution Function
5%
Electric Potential
17%
Electron Cyclotron Resonance
6%
Electron Density
37%
Electron Emission
11%
Electron Energy
31%
Electron Trajectory
6%
Endothermic Reaction
6%
Energy Distribution
12%
Energy Gaps (Solid State)
6%
Gas Discharges
8%
Gas Pressure
22%
Helicon
26%
Ion Beams
6%
Ion Current
9%
Ion Implantation
39%
Magnetic Field
100%
Magnetron Sputtering
52%
Metastable Atom
13%
Microplasmas
13%
Monte Carlo
30%
Nonuniform Plasmas
13%
Plasma Density
17%
Plasma Diffusion
25%
Plasma Frequency
70%
Plasma System
6%
Radio Frequency Discharge
71%
Remote Control
13%
Room Temperature
6%
Spatial Distribution
13%
Thin Films
13%
Transmittance
6%
Vapor Deposition
7%
Young's Modulus
13%
Engineering
Anisotropic
13%
Antenna
13%
Bias Voltage
11%
Boiling Point
13%
Boltzmann Equation
22%
Capacitive
13%
Capacitive Coupling
13%
Cavity Length
9%
Constraint Condition
13%
Coupling Effect
14%
Demonstrates
19%
Deposition Rate
13%
Dielectric Window
13%
Direct Current
13%
Eigenmode
19%
Electric Potential
13%
Electrode Surface
13%
Electron Temperature
9%
Emission Spectra
13%
Energy Density
13%
Engineering
13%
Experimental Result
13%
Fluid Model
15%
Forming
13%
Gas Pressure
14%
High Power Impulse Magnetron Sputtering
16%
Inductively Coupled Plasma
16%
Input Power
16%
Ion Implantation
39%
Ionization Rate
13%
Low Surface Tension
13%
Magnetic Field
49%
Magnetron
26%
Microplasmas
26%
Microstructure
39%
Nanocomposite
13%
Partial Pressure
9%
Physical Interaction
13%
Plasma Density
8%
Plasma Fluid Model
13%
Power Absorption
16%
Pressure Balance
13%
Pulse-off Time
10%
Radio Frequency
30%
Similarities
19%
Spatial Distribution
16%
Sputtering Yield
13%
Textured Surface
13%
Thermal Conductivity
13%
Two Dimensional
19%
Material Science
Austenitic Stainless Steels
7%
Biochar
19%
Capacitance
32%
Cathode
42%
Density
43%
Dielectric Material
16%
Electrical Resistivity
5%
Electrophoretic Deposition
26%
Electrophoretic Technology
9%
Energy Density
15%
Film
6%
Graphene
32%
High Power Impulse Magnetron Sputtering
29%
Hydraulics
6%
Indium Ion
9%
Indium Tin Oxide
6%
Ion Implantation
66%
Lithium-Sulfur Battery
13%
Magnetron Sputtering
49%
Material Processing
13%
MXene
26%
Nanocomposite Coating
26%
Nanocrystalline Material
16%
Oxide Compound
5%
Plasma Density
17%
Polyaniline
13%
Reduced Graphene Oxide
13%
Refractive Index
13%
Semi-Analytical Method
13%
Silver
13%
Supercapacitors
60%
Surface Tension
13%
Surface Treatment
29%
Thermal Conductivity
13%
Thin Films
13%
Titanium Carbide
6%
Water Vapor
13%
