Ultra-High-Sensitivity photodetector from ultraviolet to visible based on Ga-doped In2O3 nanowire phototransistor with top-gate structure

Wenhao Ran, Zhen Lou, Guozhen Shen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Citation (Scopus)

Abstract

High-performance Ga-doped In2O3 nanowire phototransistor based on top-gate structure was fabricated with gate dielectric is SiO2. By adjusting gate voltage of the phototransistor, the device can detect extremely weak ultraviolet light, with high responsivity (R) and large light-dark current ratio (I ph}}/I dark}}). For example, its responsivity can reach 580 A W and I ph}}/I dark} is maintained at 105 with 300 nm illumination (0.0

Original languageEnglish
Title of host publication2021 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728181769
DOIs
Publication statusPublished - 8 Apr 2021
Externally publishedYes
Event5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021 - Chengdu, China
Duration: 8 Apr 202111 Apr 2021

Publication series

Name2021 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021

Conference

Conference5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021
Country/TerritoryChina
CityChengdu
Period8/04/2111/04/21

Keywords

  • Ga-doped InO
  • nanowire
  • phototransistor and ultraviolet photoresponse

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