The role of oxygen in the deposition of copper-calcium thin film as diffusion barrier for copper metallization

Zhinong Yu*, Ruihuang Ren, Jianshe Xue, Qi Yao, Zhengliang Li, Guanbao Hui, Wei Xue

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Fingerprint

Dive into the research topics of 'The role of oxygen in the deposition of copper-calcium thin film as diffusion barrier for copper metallization'. Together they form a unique fingerprint.

Material Science