The preparation and characterization of CN _x film with high nitrogen content by cathode electrodeposition

CN _x thin film with high nitrogen content was prepared on ITO conductive glass substrates by cathode electrodeposition, using dicyandiamide (C ₂ H ₄ N ₄ ) in acetone as precursors. The surface morphologies, atomic bonding state, and chemical composition were analyzed by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FT-IR) spectroscopy. The CN _x particles got nanometer level with the average size of 80 nm. The maximum value of the N/C atomic ratio was more than 1. Carbon and nitrogen existed mainly in the form of tetrahedral C=N bonds, with a few C=6;N bonds. From UV-Vis absorption spectrum, we found that during near-ultraviolet area the deposited CN _x films appeared nonlinear optical absorption phenomena, and the ultraviolet light (200-280 nm) could be transmitted. The electrical resistivities of the films were in the range of 10 ¹² -10 ¹⁶ Ω cm.