Synthesis of nitrogenated carbon films by cathodic electrodeposition at the solid-liquid interface

Qiang Fu; Chuan Bao Cao; He Sun Zhu

doi:10.1016/S0167-577X(99)00177-9

Synthesis of nitrogenated carbon films by cathodic electrodeposition at the solid-liquid interface

Qiang Fu^*, Chuan Bao Cao, He Sun Zhu

^*Corresponding author for this work

School of Material Science and Engineering

Beijing Institute of Technology

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

Nitrogenated carbon films were prepared on silicon substrates by cathodic electrodepositon from solutions of dicyandiamide (C₂H₄N₄) in ethanol. The composition and structure of the films were characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy and Raman spectroscopy. The results show that the incorporated nitrogen in the films is chemically bonded to carbon with C-N, C=N and C≡N bonds, and the concentration of the depositing solutions has a great effect on the films deposition. The films have good chemical inertness and mechanical properties. A hardness of 1200 HV has been measured.

Original language	English
Pages (from-to)	166-170
Number of pages	5
Journal	Materials Letters
Volume	42
Issue number	3
DOIs	https://doi.org/10.1016/S0167-577X(99)00177-9
Publication status	Published - 2000

Keywords

Carbon nitride films
Electrodeposition
Hardness

Access to Document

10.1016/S0167-577X(99)00177-9

Cite this

@article{41efe7c43c6b4d558605fd2103d92ecb,

title = "Synthesis of nitrogenated carbon films by cathodic electrodeposition at the solid-liquid interface",

abstract = "Nitrogenated carbon films were prepared on silicon substrates by cathodic electrodepositon from solutions of dicyandiamide (C2H4N4) in ethanol. The composition and structure of the films were characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy and Raman spectroscopy. The results show that the incorporated nitrogen in the films is chemically bonded to carbon with C-N, C=N and C≡N bonds, and the concentration of the depositing solutions has a great effect on the films deposition. The films have good chemical inertness and mechanical properties. A hardness of 1200 HV has been measured.",

keywords = "Carbon nitride films, Electrodeposition, Hardness",

author = "Qiang Fu and Cao, {Chuan Bao} and Zhu, {He Sun}",

year = "2000",

doi = "10.1016/S0167-577X(99)00177-9",

language = "English",

volume = "42",

pages = "166--170",

journal = "Materials Letters",

issn = "0167-577X",

publisher = "Elsevier B.V.",

number = "3",

}

TY - JOUR

T1 - Synthesis of nitrogenated carbon films by cathodic electrodeposition at the solid-liquid interface

AU - Fu, Qiang

AU - Cao, Chuan Bao

AU - Zhu, He Sun

PY - 2000

Y1 - 2000

N2 - Nitrogenated carbon films were prepared on silicon substrates by cathodic electrodepositon from solutions of dicyandiamide (C2H4N4) in ethanol. The composition and structure of the films were characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy and Raman spectroscopy. The results show that the incorporated nitrogen in the films is chemically bonded to carbon with C-N, C=N and C≡N bonds, and the concentration of the depositing solutions has a great effect on the films deposition. The films have good chemical inertness and mechanical properties. A hardness of 1200 HV has been measured.

AB - Nitrogenated carbon films were prepared on silicon substrates by cathodic electrodepositon from solutions of dicyandiamide (C2H4N4) in ethanol. The composition and structure of the films were characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy and Raman spectroscopy. The results show that the incorporated nitrogen in the films is chemically bonded to carbon with C-N, C=N and C≡N bonds, and the concentration of the depositing solutions has a great effect on the films deposition. The films have good chemical inertness and mechanical properties. A hardness of 1200 HV has been measured.

KW - Carbon nitride films

KW - Electrodeposition

KW - Hardness

UR - http://www.scopus.com/inward/record.url?scp=0001514320&partnerID=8YFLogxK

U2 - 10.1016/S0167-577X(99)00177-9

DO - 10.1016/S0167-577X(99)00177-9

M3 - Article

AN - SCOPUS:0001514320

SN - 0167-577X

VL - 42

SP - 166

EP - 170

JO - Materials Letters

JF - Materials Letters

IS - 3

ER -

Synthesis of nitrogenated carbon films by cathodic electrodeposition at the solid-liquid interface

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this