Super absorbing nano-gap metasurface with sub-5-nm gaps for extreme light confinement

Dengxin Ji, Alec Cheney, Nan Zhang, Haomin Song, Jun Gao, Xie Zeng, Haifeng Hu, Suhua Jiang, Zongfu Yu, Qiaoqiang Gan*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We report a metamaterial super absorber structure with sub-5-nm gaps fabricated using atomic layer deposition processes for extreme light confinement. Light trapping efficiency of 81% is experimentally demonstrated at mid-infrared wavelengths.

Original languageEnglish
Title of host publicationCLEO
Subtitle of host publicationScience and Innovations, CLEO_SI 2018
PublisherOptica Publishing Group (formerly OSA)
ISBN (Print)9781943580422
DOIs
Publication statusPublished - 2018
Externally publishedYes
EventCLEO: Science and Innovations, CLEO_SI 2018 - San Jose, United States
Duration: 13 May 201818 May 2018

Publication series

NameOptics InfoBase Conference Papers
VolumePart F94-CLEO_SI 2018
ISSN (Electronic)2162-2701

Conference

ConferenceCLEO: Science and Innovations, CLEO_SI 2018
Country/TerritoryUnited States
CitySan Jose
Period13/05/1818/05/18

Fingerprint

Dive into the research topics of 'Super absorbing nano-gap metasurface with sub-5-nm gaps for extreme light confinement'. Together they form a unique fingerprint.

Cite this