Stacking-dependent electronic property of trilayer graphene epitaxially grown on Ru(0001)

Yande Que, Wende Xiao*, Hui Chen, Dongfei Wang, Shixuan Du, Hong Jun Gao

*Corresponding author for this work

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Abstract

The growth, atomic structure, and electronic property of trilayer graphene (TLG) on Ru(0001) were studied by low temperature scanning tunneling microscopy and spectroscopy in combined with tight-binding approximation (TBA) calculations. TLG on Ru(0001) shows a flat surface with a hexagonal lattice due to the screening effect of the bottom two layers and the AB-stacking in the top two layers. The coexistence of AA- and AB-stacking in the bottom two layers leads to three different stacking orders of TLG, namely, ABA-, ABC-, and ABB-stacking. STS measurements combined with TBA calculations reveal that the density of states of TLG with ABC- and ABB-stacking is characterized by one and two sharp peaks near to the Fermi level, respectively, in contrast to the V-shaped feature of TLG with ABA-stacking. Our work demonstrates that TLG on Ru(0001) might be an ideal platform for exploring stacking-dependent electronic properties of graphene.

Original languageEnglish
Article number263101
JournalApplied Physics Letters
Volume107
Issue number26
DOIs
Publication statusPublished - 28 Dec 2015
Externally publishedYes

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Que, Y., Xiao, W., Chen, H., Wang, D., Du, S., & Gao, H. J. (2015). Stacking-dependent electronic property of trilayer graphene epitaxially grown on Ru(0001). Applied Physics Letters, 107(26), Article 263101. https://doi.org/10.1063/1.4938466