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Reduced screening of remote phonon scattering in thin-film transistors caused by gate-electrode/gate-dielectric interlayer
Y. X. Ma
, W. M. Tang
*
, P. T. Lai
*
*
Corresponding author for this work
School of Integrated Circuits and Electronics
The University of Hong Kong
Research output
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Contribution to journal
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Article
›
peer-review
11
Citations (Scopus)
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Material Science
Dielectric Material
100%
Thin-Film Transistor
100%
Annealing
20%
Carrier Mobility
20%
Transmission Electron Microscopy
10%
Density
10%
Grain Size
10%
Oxide Compound
10%
Surface Roughness
10%
Carrier Transport
10%