Quantum Dots Photoresist for Direct Photolithography Patterning

Zhiyuan Gao, Jianbing Shi, Gaoling Yang*

*Corresponding author for this work

Research output: Contribution to journalReview articlepeer-review

2 Citations (Scopus)
Plum Print visual indicator of research metrics
  • Citations
    • Citation Indexes: 1
  • Captures
    • Readers: 8
  • Mentions
    • News Mentions: 1
see details

Fingerprint

Dive into the research topics of 'Quantum Dots Photoresist for Direct Photolithography Patterning'. Together they form a unique fingerprint.

Material Science