Quantitative-regulated material removal rate in solid dielectric electrochemical polishing (QRR-SDEP) for smoothing high roughness surface of additively manufactured 316L stainless steel components

Shenggui Liu, Chaojiang Li, Xin Jin, Wang Jiang, Xun Cao, Guodong Liu*, Zilong Guo, Yu Xin Yang, Lawrence Chen Lym Ong

*Corresponding author for this work

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6 Citations (Scopus)

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