Numerical simulation of chemical processes in helium plasmas in atmosphere environment

Jian Ming Ouyang; Wei Guo; Long Wang; Fu Qiu Shao

doi:10.1088/1009-1963/14/1/028

Numerical simulation of chemical processes in helium plasmas in atmosphere environment

Jian Ming Ouyang^*, Wei Guo, Long Wang, Fu Qiu Shao

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.

Original language	English
Pages (from-to)	154-158
Number of pages	5
Journal	Chinese Physics
Volume	14
Issue number	1
DOIs	https://doi.org/10.1088/1009-1963/14/1/028
Publication status	Published - Jan 2005
Externally published	Yes

Keywords

Chemical processes
Helium plasma
Lifetime

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10.1088/1009-1963/14/1/028

Cite this

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title = "Numerical simulation of chemical processes in helium plasmas in atmosphere environment",

abstract = "A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.",

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author = "Ouyang, {Jian Ming} and Wei Guo and Long Wang and Shao, {Fu Qiu}",

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AU - Ouyang, Jian Ming

AU - Guo, Wei

AU - Wang, Long

AU - Shao, Fu Qiu

PY - 2005/1

Y1 - 2005/1

N2 - A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.

AB - A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.

KW - Chemical processes

KW - Helium plasma

KW - Lifetime

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U2 - 10.1088/1009-1963/14/1/028

DO - 10.1088/1009-1963/14/1/028

M3 - Article

AN - SCOPUS:24144447837

SN - 1009-1963

VL - 14

SP - 154

EP - 158

JO - Chinese Physics

JF - Chinese Physics

IS - 1

ER -

Numerical simulation of chemical processes in helium plasmas in atmosphere environment

Abstract

Keywords

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