Numerical simulation of chemical processes in atmospheric plasmas

Jian Ming Ouyang; Wei Guo; Long Wang; Fu Qiu Shao

doi:10.1088/1009-1963/13/12/035

Numerical simulation of chemical processes in atmospheric plasmas

Jian Ming Ouyang^*, Wei Guo, Long Wang, Fu Qiu Shao

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

A model is built to study chemical processes in atmospheric plasmas at low altitude (high pressure) and at high altitude (low pressure). The plasma lifetime and the temporal evolution of the main charged species are presented. The electron number density does not strictly obey the exponential damping law in a long period. The heavy charged species are dominant at low altitude in comparison with the light species at high altitude. Some species of small amount in natural air play an important role in the processes.

Original language	English
Pages (from-to)	2174-2180
Number of pages	7
Journal	Chinese Physics
Volume	13
Issue number	12
DOIs	https://doi.org/10.1088/1009-1963/13/12/035
Publication status	Published - 1 Dec 2004
Externally published	Yes

Keywords

Atmospheric plasma
Chemical processes
Lifetime

Access to Document

10.1088/1009-1963/13/12/035

Cite this

@article{5acd5460b13a4b1892b9224a9511a1fb,

title = "Numerical simulation of chemical processes in atmospheric plasmas",

abstract = "A model is built to study chemical processes in atmospheric plasmas at low altitude (high pressure) and at high altitude (low pressure). The plasma lifetime and the temporal evolution of the main charged species are presented. The electron number density does not strictly obey the exponential damping law in a long period. The heavy charged species are dominant at low altitude in comparison with the light species at high altitude. Some species of small amount in natural air play an important role in the processes.",

keywords = "Atmospheric plasma, Chemical processes, Lifetime",

author = "Ouyang, {Jian Ming} and Wei Guo and Long Wang and Shao, {Fu Qiu}",

year = "2004",

month = dec,

day = "1",

doi = "10.1088/1009-1963/13/12/035",

language = "English",

volume = "13",

pages = "2174--2180",

journal = "Chinese Physics",

issn = "1009-1963",

publisher = "IOP Publishing Ltd.",

number = "12",

}

TY - JOUR

T1 - Numerical simulation of chemical processes in atmospheric plasmas

AU - Ouyang, Jian Ming

AU - Guo, Wei

AU - Wang, Long

AU - Shao, Fu Qiu

PY - 2004/12/1

Y1 - 2004/12/1

N2 - A model is built to study chemical processes in atmospheric plasmas at low altitude (high pressure) and at high altitude (low pressure). The plasma lifetime and the temporal evolution of the main charged species are presented. The electron number density does not strictly obey the exponential damping law in a long period. The heavy charged species are dominant at low altitude in comparison with the light species at high altitude. Some species of small amount in natural air play an important role in the processes.

AB - A model is built to study chemical processes in atmospheric plasmas at low altitude (high pressure) and at high altitude (low pressure). The plasma lifetime and the temporal evolution of the main charged species are presented. The electron number density does not strictly obey the exponential damping law in a long period. The heavy charged species are dominant at low altitude in comparison with the light species at high altitude. Some species of small amount in natural air play an important role in the processes.

KW - Atmospheric plasma

KW - Chemical processes

KW - Lifetime

UR - http://www.scopus.com/inward/record.url?scp=23244455388&partnerID=8YFLogxK

U2 - 10.1088/1009-1963/13/12/035

DO - 10.1088/1009-1963/13/12/035

M3 - Article

AN - SCOPUS:23244455388

SN - 1009-1963

VL - 13

SP - 2174

EP - 2180

JO - Chinese Physics

JF - Chinese Physics

IS - 12

ER -

Numerical simulation of chemical processes in atmospheric plasmas

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this