Investigation of multi-beam interference under asymmetric exposure conditions

Zhidong Liu; Yuwei Chai; Haiyang Li; Xin Gan; Jinliang Zang; Guoguo Kang

doi:10.1016/j.optcom.2019.125080

Investigation of multi-beam interference under asymmetric exposure conditions

Zhidong Liu, Yuwei Chai, Haiyang Li, Xin Gan, Jinliang Zang, Guoguo Kang^*

^*Corresponding author for this work

School of Optics and Photonics

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

In this paper, the complex patterns of multi-beam interference under asymmetric conditions, i.e. the interfering beams with non-identical amplitude, incidence, azimuth or polarization, were investigated both theoretically and experimentally. The presented interference patterns of various exposure combinations suggest that the change of incidence or azimuth angle affects both the pattern period and shape, while the change of amplitude or polarization does not affect the period at all, but only the pattern shape. This finding should be useful when utilizing holographic lithography to fabricate periodically arranged patterns.

Original language	English
Article number	125080
Journal	Optics Communications
Volume	459
DOIs	https://doi.org/10.1016/j.optcom.2019.125080
Publication status	Published - 15 Mar 2020

Keywords

Asymmetric exposure
Multi-beam interference
Polarization

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10.1016/j.optcom.2019.125080

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@article{a47f090daa7c4f68a70c0cda2a60726f,

title = "Investigation of multi-beam interference under asymmetric exposure conditions",

abstract = "In this paper, the complex patterns of multi-beam interference under asymmetric conditions, i.e. the interfering beams with non-identical amplitude, incidence, azimuth or polarization, were investigated both theoretically and experimentally. The presented interference patterns of various exposure combinations suggest that the change of incidence or azimuth angle affects both the pattern period and shape, while the change of amplitude or polarization does not affect the period at all, but only the pattern shape. This finding should be useful when utilizing holographic lithography to fabricate periodically arranged patterns.",

keywords = "Asymmetric exposure, Multi-beam interference, Polarization",

author = "Zhidong Liu and Yuwei Chai and Haiyang Li and Xin Gan and Jinliang Zang and Guoguo Kang",

note = "Publisher Copyright: {\textcopyright} 2019 Elsevier B.V.",

year = "2020",

month = mar,

day = "15",

doi = "10.1016/j.optcom.2019.125080",

language = "English",

volume = "459",

journal = "Optics Communications",

issn = "0030-4018",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Investigation of multi-beam interference under asymmetric exposure conditions

AU - Liu, Zhidong

AU - Chai, Yuwei

AU - Li, Haiyang

AU - Gan, Xin

AU - Zang, Jinliang

AU - Kang, Guoguo

PY - 2020/3/15

Y1 - 2020/3/15

N2 - In this paper, the complex patterns of multi-beam interference under asymmetric conditions, i.e. the interfering beams with non-identical amplitude, incidence, azimuth or polarization, were investigated both theoretically and experimentally. The presented interference patterns of various exposure combinations suggest that the change of incidence or azimuth angle affects both the pattern period and shape, while the change of amplitude or polarization does not affect the period at all, but only the pattern shape. This finding should be useful when utilizing holographic lithography to fabricate periodically arranged patterns.

AB - In this paper, the complex patterns of multi-beam interference under asymmetric conditions, i.e. the interfering beams with non-identical amplitude, incidence, azimuth or polarization, were investigated both theoretically and experimentally. The presented interference patterns of various exposure combinations suggest that the change of incidence or azimuth angle affects both the pattern period and shape, while the change of amplitude or polarization does not affect the period at all, but only the pattern shape. This finding should be useful when utilizing holographic lithography to fabricate periodically arranged patterns.

KW - Asymmetric exposure

KW - Multi-beam interference

KW - Polarization

UR - http://www.scopus.com/inward/record.url?scp=85076237909&partnerID=8YFLogxK

U2 - 10.1016/j.optcom.2019.125080

DO - 10.1016/j.optcom.2019.125080

M3 - Article

AN - SCOPUS:85076237909

SN - 0030-4018

VL - 459

JO - Optics Communications

JF - Optics Communications

M1 - 125080

ER -

Investigation of multi-beam interference under asymmetric exposure conditions

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Keywords

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