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Informatics-based computational lithography for phase-shifting mask optimization
Yihua Pan,
Xu Ma
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Corresponding author for this work
School of Optics and Photonics
Beijing Institute of Technology
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peer-review
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Engineering
Error Image
33%
Information Channel
33%
Mutual Information
33%
Optical Lithography
100%
Semiconductor Fabrication
33%
Material Science
Optical Lithography
100%