Improvement of thermal properties in epitaxial aluminum nitride pedestal microring

Xianwen Liu, Changzheng Sun, Bing Xiong, Zhibiao Hao, Yanjun Han, Jian Wang, Lai Wang, Yi Luo

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

We report thermal properties improvement of aluminum nitride (AlN) microring resonator by adopting epitaxial material and pedestal structure. With optimized inductively coupled plasma (ICP) dry etching using Cl2/BCl3/Ar mixture, pedestal microring resonators have been fabricated on epitaxial AlN. Transmission measurement reveals a loaded quality factor of ∼1×104 at under-coupled condition, corresponding to a propagation loss of 27 dB/cm around 1.55 μm. Thermal effect induced resonant peak shift at different coupled powers is 6.3 pm/mW, and optical bistability can be observed at an input power above ∼115 mW.

Original languageEnglish
Title of host publicationICOCN 2015 - 14th International Conference on Optical Communications and Networks, Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781467373739
DOIs
Publication statusPublished - 14 Aug 2015
Externally publishedYes
Event14th International Conference on Optical Communications and Networks, ICOCN 2015 - Nanjing, China
Duration: 3 Jul 20155 Jul 2015

Publication series

NameICOCN 2015 - 14th International Conference on Optical Communications and Networks, Proceedings

Conference

Conference14th International Conference on Optical Communications and Networks, ICOCN 2015
Country/TerritoryChina
CityNanjing
Period3/07/155/07/15

Keywords

  • Epitaxial AlN
  • ICP dry etching
  • pedestal microring
  • thermal properties

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