Formation of SiO2 thin films through plasma- enhanced chemical vapor deposition using SiH4/Ar/N2O

Jingjing Zhang, Jingquan Guo, Qiutong Zhao, Lihui Yu, Shujun Ye*, Hongxing Yin, Yeliang Wang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

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